Water Vapour Pumping
In high vacuum systems, water vapor is usually the most reactive pollutant. You can anticipate a 20% to 100% improvement in product throughput in your current system and better deposition quality with our MaxCool Cryochillers.
- Pumpdown time at high vacuum reduced by up to 75%
- 20% to 100% increase in product throughput
- Reduced water vapour partial pressure during processing to improve adhesion, yield better films, and increase deposition repeatability
- Quick return on investment since liquid nitrogen is no longer a recurring expense
- Reduce ownership costs with electricity management
- Large capacity heating and cooling for a range of applications
MaxCool Cryochillers can significantly shorten pumpdown times and boost product throughput when integrated into your vacuum system. With a true fast-cycle capabilities, the MaxCool can thaw in less than four minutes and begin pumping water vapor in minutes. Additionally, it features a feature called Rapid Cool to Cool, which allows your system to run more production cycles during a shift by removing the waiting period following thaw. Our MaxCool cryochillers use unique Polycold® refrigerant combinations that operate based on the Meissner trapping principle. Condensation occurs on a Meissner coil—a surface that is cryogenically cooled—to collect water vapor. Since the Meissner (cryocoil) is installed directly within the vacuum chamber, ports, manifolds, valves, and baffles cannot restrict conductivity. Installing the cryocoil is simple, and it can